Nanofabrication in adsorbed layer of silver ions on TiO2 films by voltage pulses in STM

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 455-458

  Gurin, V S ^b   Poroshkov, V P ^a  

^a BELARUSIAN STATE UNIVERSITY   (Belarus)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODEPOSITION; ELECTROLYTIC REDUCTION; IONS; SCANNING TUNNELING MICROSCOPY; SILVER; SURFACE STRUCTURE; THIN FILMS; TITANIUM DIOXIDE;

ELECTROREDUCTION; SILVER IONS; VOLTAGE PULSES;

NANOTECHNOLOGY;

EID: 0029771240     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00286-3     Document Type: Article

References (13)

1. Proc. of MNE'94, Microelectr. Eng. 27 (1995) 1-116.
2. L.F. Quate, Scanning Tunneling Microscopy and Related Methods. Kluwer Acad. Publ., Dordrecht, 1990, P. 281.
3. R. Wiesendanger, Appl. Surf. Sci. 54 (1992) 271.
4. S. Kondo, S. Heike, M. Lutwyche and Y. Wada, Appl. Phys. Lett. 78 (1995) 155.
5. O.E. Hüsser, D.H. Craston and A.J. Bard, J. Vac. Sci. Technol. 6 (1988) 1873.
6. T. Thundat, L.A. Nagahara, and S.M. Lindsay, J. Vac. Sci. Technol. A8 (1990) 539.
7. R. Richter and H.L. Harthage, Int. J. Electron., 69 (1990) 631.
8. W. Li, J.A. Virtanen and R.M. Penner, Appl. Phys. Lett., 60 (1992) 1181.
9. R. Sasano, K. Nakamura, K. Kaneto, Jpn. J. Appl. Phys. 32 (1993) L863.
10. A.L. Linsebigler, G. Lu and J.T. Yates jr., Chem. Rev. 95 (1995) 735.
11. V.P. Poroshkov and V.S. Gurin, Surf. Sci. 331/333 (1995) 1520.
12. Y.F. Nicolau, M. Dupuy and M. Brunel, J. Electrochem. Soc. 137 (1990) 2915.
13. V.P. Poroshkov, V.S. Gurin and N.I. Kuntsevich, Ext. Abstr. of 186th Annu. Meet. of the Electrochemical Society, Maiami Beach, 1994, p. 523.