Characterisation of the oxidation kinetics of thin, low temperature, electroless plated copper films

Materials Research Society Symposium - Proceedings

Volumn 406, Issue , 1996, Pages 353-358

  Beechinor, J T ^a   O'Reilly, M ^a   Patterson, J C ^a   Lynch, S ^a   Lafferty, E ^a   Kelly, P V ^a   Crean, G M ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMISTRY; COPPER; DEPOSITION; ELLIPSOMETRY; MORPHOLOGY; OXIDATION; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; X RAY DIFFRACTION;

CUPROUS OXIDE; ELECTROLESS PLATED COPPER FILMS; ELECTROLESS SOLUTION; OXIDATION INHIBITOR;

METALLIC FILMS;

EID: 0029771184     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)