Using optical pattern filtering defect inspection tools and process-induced defects per wafer pass for process defect control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2725, Issue , 1996, Pages 217-232

  Alvis, John R ^a   Satterfield, Michael J ^a   Gabella, Patricia ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL PATTERN FILTERING; PATTERNED WAFERS;

DEFECTS; DIFFRACTION GRATINGS; INSPECTION; MASKS; OPTICAL FILTERS; PROCESS CONTROL;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0029768155     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)