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Volumn 395, Issue , 1996, Pages 279-282
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Low resistivity aluminum nitride: carbon (AlN:C) films grown by metal organic chemical vapor deposition
a
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Author keywords
[No Author keywords available]
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Indexed keywords
AMMONIA;
CARBON;
ELECTRIC CONDUCTIVITY;
FILM GROWTH;
HETEROJUNCTIONS;
HIGH PRESSURE EFFECTS;
HYDROGEN;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
PROPANE;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
SEMICONDUCTING FILMS;
SINGLE CRYSTALS;
ALUMINUM NITRIDE;
PRECURSORS;
TRIMETHYLALUMINUM;
VAN DER PAW MEASUREMENTS;
SEMICONDUCTING ALUMINUM COMPOUNDS;
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EID: 0029766285
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (8)
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References (3)
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