Monte Carlo simulation of simple models for thin film growth by MBE

Thin Solid Films

Volumn 272, Issue 2, 1996, Pages 184-194

  Landau, D P ^a   Pal, S ^a  

^a UNIVERSITY OF GEORGIA   (United States)

Author keywords

Computer simulation; Molecular beam epitaxy

Indexed keywords

BOUNDARY CONDITIONS; COMPUTER SIMULATION; DEPOSITION; DIFFUSION; MATHEMATICAL MODELS; MOLECULAR BEAM EPITAXY; MONTE CARLO METHODS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS;

ACTIVATED ATOM HOPPING; INTERFACIAL WIDTH; SOLID ON SOLID MODEL;

FILM GROWTH;

EID: 0029762538     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)06945-3     Document Type: Article

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