Fractal growth of clusters and pores during annealing of aluminum thin films deposited on silica

Materials Research Society Symposium - Proceedings

Volumn 407, Issue , 1996, Pages 287-294

  Fleury, Vincent ^a   Balazs, Lazlo ^a   Duclos, Franck ^a  

^a ECOLE POLYTECHNIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL GROWTH; CRYSTAL STRUCTURE; DEPOSITION; FRACTALS; MATHEMATICAL MODELS; MOLECULAR BEAM EPITAXY; MORPHOLOGY; REDOX REACTIONS; SILICA; THIN FILMS;

CLUSTERS; DIFFUSION LIMITED AGGREGATION; FRACTAL GROWTH; IRREVERSIBLE GROWTH; PATTERN FORMATION; PORES;

ALUMINUM;

EID: 0029760816     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (25)