Epitaxial growth and characterization of Nbx Ti1-xO2 rutile films by oxygen-plasma-assisted molecular beam epitaxy

Materials Research Society Symposium - Proceedings

Volumn 401, Issue , 1996, Pages 85-90

  Gao, Y ^a   Chambers, S A ^a  

^a PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DOPING (ADDITIVES); EPITAXIAL GROWTH; LOW ENERGY ELECTRON DIFFRACTION; MOLECULAR BEAM EPITAXY; NIOBIUM; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; TITANIUM; TITANIUM DIOXIDE; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

NIOBIUM TITANIUM DIOXIDE; OXIDATION STATE; OXYGEN PLASMA ASSISTED MOLECULAR BEAM EPITAXY; RUTILE; ULTRAVIOLET PHOTOEMISSION SPECTROSCOPY;

NIOBIUM COMPOUNDS;

EID: 0029757014     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (24)