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Volumn 35, Issue 1 A, 1996, Pages 16-21
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Compositional relation of GaAsxSb1-x and related compounds in metalorganic chemical vapor deposition using tBAs and TMSb as group V precursors
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Author keywords
GaAs; GaSb; Mixed crystal; MOCVD; Semiconductor; Thermodynamics
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Indexed keywords
CALCULATIONS;
COMPOSITION;
LOW TEMPERATURE OPERATIONS;
MATHEMATICAL MODELS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTING ANTIMONY;
SEMICONDUCTING GALLIUM;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTING INDIUM COMPOUNDS;
SEMICONDUCTOR GROWTH;
SURFACE PHENOMENA;
THERMODYNAMICS;
HIGH REACTION EQUILIBRIUM COEFFICIENT;
METALLORGANIC CHEMICAL VAPOR DEPOSITION GROWTH;
METHYL GROUP;
MIXED CRYSTAL;
PRECURSORS;
THERMAL EQUILIBRIUM RELATION;
THERMODYNAMIC MODEL;
SEMICONDUCTING GALLIUM COMPOUNDS;
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EID: 0029756422
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/JJAP.35.16 Document Type: Article |
Times cited : (8)
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References (11)
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