Atomic scale control of epitaxial growth and interface in oxide thin films for advanced oxide lattice engineering

Materials Research Society Symposium - Proceedings

Volumn 401, Issue , 1996, Pages 21-31

  Yoshimoto, M ^a   Maeda, T ^a   Ohnishi, T ^a   Lee, G H ^a   Koinuma, H ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL LATTICES; DEPOSITION; EPITAXIAL GROWTH; FILM GROWTH; INTERFACES (MATERIALS); MOLECULAR BEAM EPITAXY; PULSED LASER APPLICATIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING SILICON; THIN FILMS;

ATOMIC SCALE CONTROL; ION SCATTERING SPECTROSCOPY; OXIDE LATTICE ENGINEERING; OXIDE THIN FILMS; QUANTUM FUNCTIONAL OXIDES;

OXIDES;

EID: 0029755819     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (25)