Identification of oxidation mechanisms in silicon nitride ceramics by TEM

Key Engineering Materials

Volumn 113, Issue , 1996, Pages 81-90

  Backhaus Ricoult, M ^a   Gogotsi, Y G ^b  

^a CNRS   (France)

^b UNIVERSITY OF OSLO   (Norway)

Author keywords

Oxidation; Oxide Scale; Silicate; Silicon Nitride; Transmission Electron Microscopy

Indexed keywords

COMPOSITION; DOPING (ADDITIVES); HIGH TEMPERATURE OPERATIONS; HOT ISOSTATIC PRESSING; MICROSTRUCTURE; OXIDATION RESISTANCE; OXIDES; PROTECTIVE COATINGS; SPECTROSCOPY; THERMOOXIDATION; TRANSMISSION ELECTRON MICROSCOPY; YTTRIUM COMPOUNDS;

ENERGY DISPERSIVE SPECTROSCOPY; OXIDATION RATE; OXIDE SCALES;

SILICON NITRIDE;

EID: 0029755657     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: None     Document Type: Article

References (3)

1. K.L. Luthra, J. Am. Ceram. Soc. 74, 1095-1103 (1991).
2. P. Andrews, F.L. Riley, J. Europ. Ceram. Soc. 7, 125-132 (1991).
3. Y. Hasegawa, H, Tanaka, M. Tsutsumi, H. Suzuki, Yogyo-Kyokai-Shi 88, 292-297 (1980).