Wavelength division multiplexer with photoinduced Bragg gratings fabricated in a planar-lightwave-circuit-type asymmetric Mach-Zehnder interferometer on Si

IEEE Photonics Technology Letters

Volumn 8, Issue 1, 1996, Pages 84-86

  Hibino, Y ^a   Kitagawa, T ^a,c   Hill, K O ^b   Bilodeau, F ^b   Malo, B ^b   Albert, J ^b   Johnson, D C ^b  

^a NTT CORPORATION   (Japan)

^b Industry Canada   (Canada)

^c IEEE

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; ERROR COMPENSATION; FREQUENCY DIVISION MULTIPLEXING; INTERFEROMETERS; OPTOELECTRONIC DEVICES; SEMICONDUCTING SILICON;

ASYMMETRIC MACH-ZEHNDER INTERFEROMETER; PHOTOINDUCED BRAGG GRATINGS; PLANAR LIGHTWAVE CIRCUITS; WAVELENGTH DIVISION MULTIPLEXER;

MULTIPLEXING EQUIPMENT;

EID: 0029755018     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/68.475786     Document Type: Article

References (10)

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