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Volumn 416, Issue , 1996, Pages 349-354
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Electrochemical studies of boron-doped diamond electrodes
a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
CERIUM;
CHEMICAL VAPOR DEPOSITION;
DIAMOND FILMS;
ELECTROCHEMISTRY;
HYDROGEN;
OXYGEN;
POLYCRYSTALLINE MATERIALS;
SEMICONDUCTING BORON;
SEMICONDUCTING FILMS;
SEMICONDUCTOR DOPING;
SILICON WAFERS;
TUNGSTEN SHEET;
DIAMOND ELECTRODES;
HOT FILAMENT ASSISTED CHEMICAL VAPOR DEPOSITION;
MICROWAVE ASSISTED DEPOSITION;
SUBSTRATE TEMPERATURE;
TUNGSTEN WIRES;
VOLTAMMETRY MEASUREMENT;
ELECTROCHEMICAL ELECTRODES;
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EID: 0029754789
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (20)
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References (10)
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