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Journal of the Electrochemical Society

Volumn 143, Issue 1, 1996, Pages 374-381

Thermal model validation for rapid thermal chemical vapor deposition of polysilicon

(2) Schaper, Charles a Kailath, Thomas a

a Stanford University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CLOSED LOOP CONTROL SYSTEMS; HEAT TRANSFER; MATHEMATICAL MODELS; NUMERICAL ANALYSIS; OPTIMIZATION; PERFORMANCE; TEMPERATURE CONTROL; TEMPERATURE MEASUREMENT; THICKNESS MEASUREMENT;

CLOSED LOOP TEMPERATURE CONTROLLER; HEAT TRANSFER MODEL; OPTIMAL SETTINGS; POLYSILICON; RAPID THERMAL CHEMICAL VAPOR DEPOSITION; THERMAL MODEL VALIDATION;

SEMICONDUCTING SILICON;

EID: 0029754239 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1836440 Document Type: Article

Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.