Multiphoton dissociation of phenylsilane upon excitation at 212.5 NM

Laser Chemistry

Volumn 16, Issue 3, 1996, Pages 157-166

  Oujja, Mohamed ^a   Martín, Margarita ^a   De Nalda, Rebeca ^a   Castillejo, Marta ^a  

^a INSTITUTO DE QUÍMICA FÍSICA ROCASOLANO   (Spain)

Author keywords

Multiphoton excitation; Phenylsilane; Photofragmentation

Indexed keywords

ATOMS; DISSOCIATION; EMISSION SPECTROSCOPY; FLUORESCENCE; LASERS; MOLECULAR STRUCTURE; MULTIPHOTON PROCESSES; PHOTOLYSIS; SILANES; SILICON;

MOLECULAR FRAGMENTS; MULTIPHOTON EXCITATION; PHENYLSILANE; PHOTODISSOCIATION; PHOTOFRAGMENTATION;

PHOTOCHEMICAL REACTIONS;

EID: 0029754074     PISSN: 02786273     EISSN: None     Source Type: Journal    
DOI: 10.1155/1996/60264     Document Type: Article

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