Process windows of nickel and platinum silicides in deep sub-micron regime

Materials Research Society Symposium - Proceedings

Volumn 402, Issue , 1996, Pages 59-64

  Xu, D X ^a   Das, S R ^a   McCaffrey, J P ^a   Peters, C J ^a   Erickson, L E ^a  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

NICKEL SILICIDES; PLATINUM SILICIDES; POLYSILICON; PROCESS WINDOWS; SHEET RESISTANCE; SUBMICRON RANGE; TITANIUM DISILICIDE;

CRYSTAL STRUCTURE; ELECTRIC RESISTANCE; ELECTRODES; METALLIC FILMS; MORPHOLOGY; NICKEL COMPOUNDS; PLATINUM COMPOUNDS; POLYCRYSTALS; SILICON WAFERS; SINGLE CRYSTALS; SUBSTRATES; SURFACES;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0029753924     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)