Realisation of irregular quarter-micron patterns in thick resists using an advanced e-beam sensitive TSI process

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 301-304

  Irmscher, M ^a   Hofflinger B ^a   Springer, R ^a  

^a Institut fur Mikroelektronik Stuttgart   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; DEPOSITION; ETCHING; IMAGING TECHNIQUES; MICROELECTRONIC PROCESSING; PHOTORESISTS; SURFACES;

ENERGY DEPOSITION; FLOW EFFECT; MICRON PATTERNS; PROXIMITY CORRECTION; TOP SURFACE IMAGING;

ELECTRON BEAM LITHOGRAPHY;

EID: 0029753146     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00250-2     Document Type: Article

References (6)

1. M. Irmscher, B. Höfflinger, R. Springer J. Vac. Sci. Technol. (B), 3925 (1994)
2. E.K. Pavelchek et al. Proc. SPIE Vol. 1925 (1993) 264
3. M.A. Hartney J. Vac. Sci. Technol. B11, 681 (1993)
4. S.V. Dubonos, B.N. Gaifullin, H.F. Raith, A.A. Svintsov, S.I. Zaitsev Microelectronic Engineering 21 (1993) 293-296
5. R. Lombaerts, B. Roland, A.M. Goethals, L. van den hove Proc. SPIE Vol. 1262 (1990)
6. C.A. Mack Microlithography World, Winter 1995, 24