Atmospheric pressure chemical vapor deposition of SiO2-TiO2 antireflective films from [tri-(tert-butoxy)siloxy-tri-(tert-butoxy)]titanium, [tC4H9O]3Si-O-Ti[OtC4H9]3, which is a single source alkoxide precursor

Chemical Vapor Deposition

Volumn 2, Issue 1, 1996, Pages 13-15

  Narula, Chaitanya K ^a   Varshney, Ashima ^a   Riaz, Umar ^a  

^a FORD MOTOR COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL ANALYSIS; CHEMICAL BONDS; INFRARED SPECTROSCOPY; METALLIC FILMS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICA; STOICHIOMETRY; THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION;

ALKOXIDE PRECURSOR; ANTIREFLECTIVE FILMS; ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; ELEMENTAL ANALYSIS; TRIBUTOXYSILOXY TRIBUTOXY TITANIUM;

CHEMICAL VAPOR DEPOSITION;

EID: 0029752913     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.19960020104     Document Type: Article

References (17)