E-beam lithography by using an stem with integrated laser interferometer stage

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 41-44

  Hubner B ^b   Jede, R ^c   Specht, I ^c   Zengerle, R ^a  

^a DEUTSCHE TELEKOM LABORATORIES   (Germany)

^b UNIVERSITY OF WÜRZBURG   (Germany)

^c RAITH GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON MICROSCOPES; INTERFEROMETERS; LASERS; LIGHT; SUBSTRATES;

ELECTRON OPTICAL PERFORMANCE; ELECTROSTATIC BEAM BLANKER; LASER INTERFEROMETER STAGE; SCANNING TRANSMISSION ELECTRON MICROSCOPY; VOLTAGE;

ELECTRON BEAM LITHOGRAPHY;

EID: 0029752152     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00190-5     Document Type: Article

References (6)

1. S.V. Dubonos et al, ME 27 (1995) 195
2. W. Brünger et al, ME 27 (1995)135-138
3. W. Langheinrich at al, ME 23 (1994) 287
4. R. Broßardt et al, ME 27 (1995) 139-142
5. A. Köhler, Z. Wiss. Mikr. 10 (1893) 433
6. G. Benner et al, Proc. XII ICEM, Seattle (1990) 138