193 nm laser photofragmentation time-of-flight mass spectrometric study of HSCH2CH2SH

Journal of Chemical Physics

Volumn 104, Issue 1, 1996, Pages 130-138

  Zhao, H Q ^a   Cheung, Y S ^a   Liao, C X ^a   Ng, C Y ^a   Li, Wai Kee ^b   Chiu, See Wing ^c  

^a IOWA STATE UNIVERSITY   (United States)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

^c UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; CHEMICAL BONDS; DISSOCIATION; ELECTRONIC STRUCTURE; EXCIMER LASERS; IONIZATION; LIGHT POLARIZATION; MASS SPECTROMETRY; MOLECULAR BEAMS; MOLECULAR STRUCTURE; QUANTUM THEORY;

ANGULAR DISTRIBUTION; BOND DISSOCIATION ENERGY; BOND SCISSION; FIRST ORDER CONFIGURATION INTERACTION; ISOMERS; KINETIC ENERGY; LASER PHOTOFRAGMENTATION;

SULFUR COMPOUNDS;

EID: 0029751176     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.470883     Document Type: Article

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