Atom lithography with chromium

Technical Digest - European Quantum Electronics Conference

Volumn , Issue , 1996, Pages 155-

  Drodofsky, U ^a   Drewsen, M ^a   Brezger, B ^a   Schreiber, G ^a   Krogmann, D ^a   Weber, Ch ^a   Stuhler, J ^a   Pfau, T ^a   Mlynek, J ^a  

^a UNIVERSITY OF KONSTANZ   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CHROMIUM; CRYSTALS; LASER APPLICATIONS; LASER BEAM EFFECTS; MATHEMATICAL MODELS; MONTE CARLO METHODS; NANOSTRUCTURED MATERIALS; SOLID STATE LASERS; SUBSTRATES;

ATOM LITHOGRAPHY; FREQUENCY DOUBLING; STANDING LASER WAVES;

NANOTECHNOLOGY;

EID: 0029749307     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/eqec.1996.561782     Document Type: Conference Paper

References (1)