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Volumn 32, Issue 1, 1996, Pages 51-54

Plasma cleaning techniques and future applications in environmentally conscious manufacturing

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; ENVIRONMENTAL ENGINEERING; ETCHING; MANUFACTURE; SURFACE CLEANING; SURFACE TREATMENT;

EID: 0029748917     PISSN: 00911062     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (3)

References (24)
  • 1
    • 7244240560 scopus 로고    scopus 로고
    • Envirocare of Utah, Inc., received a RCRA Part B Permit in 1990 in allowing it to store and dispose of radioactive/hazardous waste at its South Clive facility
    • Envirocare of Utah, Inc., received a RCRA Part B Permit in 1990 in allowing it to store and dispose of radioactive/hazardous waste at its South Clive facility.
  • 3
    • 7244221364 scopus 로고    scopus 로고
    • Private communications from integrated contractors
    • Private communications from integrated contractors.
  • 4
    • 0024902759 scopus 로고
    • Microelectronics Processing: Chemical Engineering Aspects
    • edited by D.W. Hess and K. F. Jensen, American Chemical Soc., Washington DC
    • D.W. Hess and D.B. Graves, "Microelectronics Processing: Chemical Engineering Aspects," Advancement in Chemistry Series, edited by D.W. Hess and K. F. Jensen, American Chemical Soc., Washington DC, 21, 377 (1989).
    • (1989) Advancement in Chemistry Series , vol.21 , pp. 377
    • Hess, D.W.1    Graves, D.B.2
  • 12
    • 0003947276 scopus 로고
    • Plasma Etching and Reactive Ion Etching
    • J.W. Coburn, "Plasma Etching and Reactive Ion Etching," AVS Monograph Series, p. 9 (1982).
    • (1982) AVS Monograph Series , pp. 9
    • Coburn, J.W.1
  • 15
    • 7244237918 scopus 로고    scopus 로고
    • D. Vogel and F. Wong, SPIE (1987)
    • D. Vogel and F. Wong, SPIE (1987).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.