Structure and chemical composition of lamellae in sputtered AlSn20 films

Materials Science Forum

Volumn 217-222, Issue PART 3, 1996, Pages 1667-1672

  Schattschneider, P ^a   Bangert, H ^a   Pongratz, P ^a   Bergauer, A ^a   Barna, P B ^b   Hofer, F ^c  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^b INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

^c Forsch Inst E   (Austria)

Author keywords

AlSn; EELS; Slide bearings; Sputter films; TEM

Indexed keywords

ALUMINUM ALLOYS; COMPOSITION; CRYSTAL STRUCTURE; ELECTRON ENERGY LOSS SPECTROSCOPY; INCLUSIONS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; SEGREGATION (METALLOGRAPHY); SURFACE ROUGHNESS; TIN; TRANSMISSION ELECTRON MICROSCOPY;

ENERGY DISPERSIVE X RAY ANALYSIS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; LAMELLAE; LAMELLAR STRUCTURE; PARALLEL DETECTION ELECTRON ENERGY LOSS SPECTROMETRY; SPUTTERED ALUMINUM TIN FILMS; TWIN BOUNDARIES;

METALLIC FILMS;

EID: 0029747689     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.217-222.1667     Document Type: Article

References (7)

1. F. Koroschetz, W. Gärtner, Österr. Patent 389356 (1989).
2. H. Bangert, Ch. Tischler, P. Schattschneider, A. Bergauer,Thin Solid Films 246, 53 (1994).
3. P. B. Barna, M. Adamik, G. Sáfrán, B. Pécz, A. Bergauer, phys. stat. sol. (a) 146, 317 (1994).
4. A. Bergauer, H. Bangert, Ch. Eisenmenger, P. B. Barna, Thin Solid Films 258, 115 (1995).
5. A. Barna, Mater. Res. Soc. Symp. Proc. 254, 3 (1991).
6. P. Schattschneider, Fundamentals of Inelastic Elecron Scattering, Springer, Wien 1986.
7. L. Reimer, Adv. Electronics Electr. Phys. 81, 43 (1991).