High-performance TSI process for e-beam using vapor-applied crosslinking silylating agents

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 564-577

  Irmscher, Mathias ^a   Hoefflinger, Bernd ^a   Springer, Reinhard ^a   Stauffer, Craig ^a   Peterson, William ^a  

^a Institut fur Mikroelektronik Stuttgart   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; CROSSLINKING; MICROMETERS; PERFORMANCE; PHOTORESISTS; SEMICONDUCTING SILICON;

SILYLATION; TSI PROCESS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0029747368     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241855     Document Type: Conference Paper

References (19)