New technique for depth profiling on a nanometer scale

Materials Research Society Symposium - Proceedings

Volumn 405, Issue , 1996, Pages 407-412

  Schwenke, H ^a   Knoth, J ^a   Guenther, R ^a   Wiener, G ^a   Bormann, R ^a  

^a INSTITUTE OF MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

IMPURITIES; INTERFACES (MATERIALS); ION BEAMS; MONOLAYERS; NANOSTRUCTURED MATERIALS; SILICON WAFERS; SPUTTER DEPOSITION; SURFACE STRUCTURE; X RAY SPECTROSCOPY; X RAYS;

DEPTH PROFILING; TOTAL REFLECTION X RAY FLUORESCENCE SPECTROMETRY (TXRF);

SEMICONDUCTOR MATERIALS;

EID: 0029746889     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)