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Volumn 397, Issue , 1996, Pages 401-406
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Optimization and transformation analysis of grain-boundary-location-controlled Si films
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
CHEMICAL VAPOR DEPOSITION;
FILMS;
GRAIN BOUNDARIES;
GROWTH (MATERIALS);
MICROSTRUCTURE;
OPTIMIZATION;
PHASE TRANSITIONS;
REACTION KINETICS;
SURFACE MEASUREMENT;
ARTIFICIALLY CONTROLLED SUPERLATERAL GROWTH;
GRAIN BOUNDARY LOCATION CONTROLLED SILICON FILMS;
TRANSIENT REFLECTANCE MEASUREMENTS;
SILICON;
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EID: 0029746135
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (11)
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References (12)
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