Light scattering measurement of surface topography during formation of titanium silicide

Materials Research Society Symposium - Proceedings

Volumn 406, Issue , 1996, Pages 163-168

  Lavoie, C ^a   Cabral Jr , C ^a   Clevenger, L A ^a   Harper, J M E ^a   Jordan Sweet, J ^a   Saenger, K L ^a   Doany, F ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; ANNEALING; ELECTRIC RESISTANCE MEASUREMENT; LIGHT SCATTERING; MICROSCOPIC EXAMINATION; PHASE TRANSITIONS; SILICON; SURFACE ROUGHNESS; TITANIUM COMPOUNDS; X RAY DIFFRACTION;

DETECTION GEOMETRY; NOMARSKI MICROSCOPY; POLYSILICON SUBSTRATES; REFLECTIVITY; TITANIUM FILMS; TOPOGRAPHY;

SURFACE STRUCTURE;

EID: 0029734962     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)