Optimum sputtering conditions on the in-situ growth of superconducting YBa2Cu3Oy films with an off-axis RF sputtering configuration

Physica C: Superconductivity and its Applications

Volumn 256, Issue 1-2, 1996, Pages 57-63

  Wang, L M ^a   Yu, H W ^a   Yang, H C ^a   Horng, H E ^b  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN NORMAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRIC CONDUCTIVITY MEASUREMENT; FILM GROWTH; HIGH TEMPERATURE SUPERCONDUCTORS; OPTIMIZATION; OXYGEN; SPUTTERING; SUPERCONDUCTING FILMS; SUPERCONDUCTING TRANSITION TEMPERATURE; TRANSPORT PROPERTIES; X RAY DIFFRACTION; YTTRIUM COMPOUNDS;

NORMAL STATE RESISTANCE RATIO; RADIO FREQUENCY SPUTTERING CONFIGURATION; SCANNING FORCE MICROSCOPY; SPUTTERING GAS; YTTRIUM BARIUM CUPRATES;

OXIDE SUPERCONDUCTORS;

EID: 0029734935     PISSN: 09214534     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-4534(95)00618-4     Document Type: Article

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