Effects of film thickness on colossal magnetoresistance in Pr0.7Sr0.3MnO3 films

Solid State Communications

Volumn 97, Issue 1, 1996, Pages 17-19

  Xiong, G C ^a   Zhang, B ^a   Wu, S C ^a   Lu, Z X ^a   Kang, J F ^a   Lian, G J ^a   Dai, D S ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FABRICATION; INTERFACES (MATERIALS); LASER BEAMS; MAGNETIC FIELD EFFECTS; MAGNETORESISTANCE; PRASEODYMIUM COMPOUNDS; PULSED LASER APPLICATIONS; SINGLE CRYSTALS; STRESSES; SUBSTRATES; TEMPERATURE;

COLOSSAL MAGNETORESISTANCE; ELECTRON DELOCALIZATION; FILM THICKNESS EFFECTS; MAGNETORESISTANCE MEASUREMENT; OXYGEN DEFICIENCY; PULSED LASER DEPOSITION; X RAY DIFFRACTION PATTERNS;

THIN FILMS;

EID: 0029734849     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/0038-1098(95)00604-4     Document Type: Article

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