Backscattering factor for KLL Auger yield from film-substrate systems

Surface and Interface Analysis

Volumn 24, Issue 1, 1996, Pages 15-22

  Lee, C L ^a   Kong, K Y ^a   Gong, H ^a   Ong, C K ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; BACKSCATTERING; BINDING ENERGY; CARBON; COMPUTER SIMULATION; ELECTRONS; FILMS; INTERPOLATION; MATHEMATICAL MODELS; MONTE CARLO METHODS; SUBSTRATES; THICKNESS MEASUREMENT;

AUGER BACKSCATTERING YIELD; BACKSCATTERED ENERGY PENETRATION DEPTH; BACKSCATTERING FACTOR; FILM THICKNESS; K-SHELL;

AUGER ELECTRON SPECTROSCOPY;

EID: 0029734815     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199601)24:1<15::AID-SIA86>3.0.CO;2-K     Document Type: Article

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