SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 272, Issue 2, 1996, Pages 331-344

Theoretical study of atomic structures and dynamics on semiconductor surfaces

(1) Ohno, Takahisa a

a NATIONAL INSTITUTE FOR MATERIALS SCIENCE (Japan)

Author keywords

Computer simulation; Etching; Growth mechanism; Semiconductors

Indexed keywords

ADSORPTION; CHLORINE; COMPUTER SIMULATION; DIFFUSION; EPITAXIAL GROWTH; ETCHING; MOLECULAR BEAM EPITAXY; MOLECULAR DYNAMICS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING SILICON; SURFACE ACTIVE AGENTS; SURFACES;

ADATOMS; SITE EXCHANGE REACTION; SURFACE RECONSTRUCTION;

CRYSTAL ATOMIC STRUCTURE;

EID: 0029734635 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/0040-6090(95)06957-7 Document Type: Article

Times cited : (21)

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