Photoluminescence from oxidized silicon nano-lines

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 463-466

  Namatsu, H ^a   Furuta, T ^a   Nagase, M ^a   Kurihara, K ^a   Iwadate, K ^a   Murase, K ^a   Makino, T ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ETCHING; INTERFACES (MATERIALS); NANOTECHNOLOGY; OXIDATION; PHOTOLUMINESCENCE; PHOTORESISTS; POROUS SILICON; SEMICONDUCTING SILICON; SILICA; SILICON WAFERS; ULTRATHIN FILMS;

PATTERNING; SILICON NANOLINES; WAVELENGTH;

NANOSTRUCTURED MATERIALS;

EID: 0029732689     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00288-X     Document Type: Article

References (7)

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