Atom lithography using light forces

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 383-386

  Drodofsky, U ^a   Drewsen, M ^a   Pfau, T ^a   Nowack, S ^a   Mlynek, J ^a  

^a UNIVERSITY OF KONSTANZ   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CHROMIUM; ELECTROMAGNETIC FIELDS; LASER BEAMS; LASERS; LIGHT; NANOSTRUCTURED MATERIALS; SUBSTRATES;

ATOM LITHOGRAPHY; CHROMIUM ATOMS; DIPOLE FORCES; LIGHT FORCES; SPONTANEOUS FORCE; TWO DIMENSIONAL PATTERN GENERATION;

NANOTECHNOLOGY;

EID: 0029732373     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00268-5     Document Type: Article

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