Sub-100 nm space pattern replication by using a cross-sectioned x-ray mask

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 219-222

  Horiuchi, T ^a   Saito, Y ^a   Komatsu, K ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; MASKS; MICROELECTRONIC PROCESSING; POLISHING; PRINTING; SILICA; SYNCHROTRON RADIATION; TANTALUM;

MASK FABRICATION METHOD; SPACE PATTERN REPLICATION; SYNCHROTRON RADIATION X RAY LITHOGRAPHY; X RAY IRRADIATION ANGLE;

X RAY LITHOGRAPHY;

EID: 0029732182     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00231-6     Document Type: Article

References (6)

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6. C. A. Mack, SPIE 1264, Optical/Laser Microlithography III, p. 71-82, 1990.