Fabrication of waveguide tapers by semitransparent mask photolithography

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 137-140

  Wengelink, J ^a   Engel, H ^a  

^a FRAUNHOFER HEINRICH HERTZ INSTITUTE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; INTEGRATED OPTOELECTRONICS; MASKS; MICROELECTRONIC PROCESSING; PHOTORESISTS; SURFACE ROUGHNESS; WAVEGUIDES;

FIBER CHIP COUPLING LOSSES; FRESNEL CORRECTION; LATERAL ALIGNMENT TOLERANCES; MASK TRANSMITTANCE; SEMITRANSPARENT MASK PHOTOLITHOGRAPHY; WAVEGUIDE TAPERS;

PHOTOLITHOGRAPHY;

EID: 0029732127     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00212-X     Document Type: Article

References (3)

1. W. Döldissen, H. Engel, J. Wengelink, and H.-J. Hensel. Lithographic fabrication of integrated microoptical elements. In ECIO'93 European Conf. on Int. Opt., Apr. 18-22, 1993, Neuchâtel, Switzerland, pp. 4-10.
2. J. Wengelink, H. Engel, and W. Döldissen. Semitransparent mask technique for relief type surface topographies. Microelectronic Engineering 27, pp. 247 (1995).
3. L. Mörl, L. Ahlers, P. Albrecht, H. Engel, H.-J. Hensel, H.-P. Nolting, and F. Reier. Efficient fiber-chip butt coupling using InGaAsP/InP waveguide tapers. In Technical Digest, Conf. on Opt. Fiber Comm. /Intern. Conf. on Int. Optics and Opt. Fiber Comm., 1993 Technical Digest Series, Vol 4 (Opt. Soc. Am., Washington, D. C., 1993), pp. 212.