Photoresist metrology based on light scattering

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2725, Issue , 1996, Pages 678-689

  Bischoff, Joerg ^a   Baumgart, Joerg W ^a   Truckenbrodt, Horst ^a   Bauer, Joachim J ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

METROLOGY; SCATTEROMETRY; SILYLATION;

ALGORITHMS; LIGHT SCATTERING; MEASUREMENTS; PERFORMANCE; REGRESSION ANALYSIS; TECHNOLOGY;

PHOTORESISTS;

EID: 0029728675     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)