Improved overlay measurement of CMP processed layers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2725, Issue , 1996, Pages 345-354

  Yeo, Jeong Ho ^a   Nam, Jeong Lim ^a   Oh, Seok H ^a   Moon, Joo T ^a   Koh, Young Bum ^a   Smith, Nigel P ^a   Smout, Andrew M ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL OPERATIONS; DATA PROCESSING; DESIGN; ERROR CORRECTION; ETCHING; IMAGING TECHNIQUES; LITHOGRAPHY; MICROELECTRONICS; PERFORMANCE; POLISHING;

CHEMICAL-MECHANICAL PROCESSES; OVERLAY METROLOGY;

PROCESS CONTROL;

EID: 0029727976     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)