Negative resists for electron-beam lithography utilizing acid-catalyzed intramolecular dehydration of phenylcarbinol

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 613-619

  Migitaka, Sonoko ^a   Uchino, Shou ichi ^a   Ueno, Takumi ^a   Yamamoto, Jiro ^a   Kojima, K ^a   Hashimoto, Michiaki ^a   Shiraishi, Hiroshi ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS; CATALYSIS; DEHYDRATION; MOLECULES; ORGANIC COMPOUNDS; PHOTORESISTS;

INTRAMOLECULAR DEHYDRATION; NEGATIVE RESISTS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0029727694     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241859     Document Type: Conference Paper

References (22)