Deposition of (Bi,Sb)2Te3 films by magnetron co-sputtering from two targets - first results

International Conference on Thermoelectrics, ICT, Proceedings

Volumn , Issue , 1996, Pages 422-424

  Stoelzer, M ^a   Bechstein, V ^a   Meusel, J ^a  

^a MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COATING TECHNIQUES; COMPOSITION; ETCHING; MAGNETRON SPUTTERING; SEMICONDUCTING TELLURIUM COMPOUNDS; SEMICONDUCTOR GROWTH; SPUTTER DEPOSITION; STOICHIOMETRY; SUBSTRATES; THERMAL EFFECTS;

ANTIMONY TELLURIDE; BISMUTH TELLURIDE; KAPTON SUBSTRATES;

SEMICONDUCTING FILMS;

EID: 0029727622     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)