Process and machine mastering employing WF-710 wafer inspection system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2725, Issue , 1996, Pages 242-254

  Schwart, Jurgen ^a   Sherman, Rivi ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DRAM; WF-710 WAFER INSPECTION SYSTEM;

DEFECTS; INSPECTION; PROCESS CONTROL; RANDOM ACCESS STORAGE;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0029727550     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (1)