Assessment of resist-specific isofocal behavior in optical lithography at half-micron resolution

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2725, Issue , 1996, Pages 85-93

  Arthur, Graham G ^a   Martin, Brian ^a  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

HALF-MICRON RESOLUTION; ISOFOCAL BEHAVIOR;

COMPUTER SIMULATION; FOCUSING; OPTICAL RESOLVING POWER; PERFORMANCE; PHOTORESISTS;

PHOTOLITHOGRAPHY;

EID: 0029727547     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)