Resist metrology for lithography simulation, part I: exposure parameter measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2725, Issue , 1996, Pages 34-48

  Mack, Chris A ^a   Matsuzawa, Toshiharu ^a   Sekiguchi, Atsushi ^a   Minami, Youichi ^a  

^a KLA Tencor Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXPOSURE PARAMETERS; RESIST METROLOGY;

COMPUTER SIMULATION; DATA PROCESSING; PHOTORESISTS; STANDARDS;

PHOTOLITHOGRAPHY;

EID: 0029727394     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)