Parasitic reactions between alkyls and ammonia in OMVPE

Materials Research Society Symposium - Proceedings

Volumn 395, Issue , 1996, Pages 103-108

  Chen, C H ^a   Liu, H ^a   Steigerwald, D ^a   Imler, W ^a   Kuo, C P ^a   Craford, M G ^a  

^a Hewlett Packard Optoelectronics Div   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CHEMICAL REACTORS; METALLORGANIC VAPOR PHASE EPITAXY; NITRIDES; PARAFFINS; PRESSURE EFFECTS; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTOR GROWTH;

ALKYLS; LEWIS BASE HYDRIDE; PARASITIC REACTIONS; TRIMETHYALLUMINUM; TRIMETHYGALLIUM; TRIMETHYLINDIUM;

CHEMICAL REACTIONS;

EID: 0029726251     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)