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Volumn , Issue , 1996, Pages 22-23
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Hot-carrier effect in ultra-thin-film (UTF) fully-depleted SOI MOSFET's
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL DEFECTS;
DEGRADATION;
ELECTRIC CURRENTS;
GATES (TRANSISTOR);
HOT CARRIERS;
INTERFACES (MATERIALS);
ION IMPLANTATION;
OXIDES;
SILICON ON INSULATOR TECHNOLOGY;
SILICON WAFERS;
THIN FILM DEVICES;
ULTRATHIN FILMS;
BURIED OXIDE;
ELECTRICAL PARAMETER DEGRADATION;
FRONT CHANNEL STRESS;
GATE OXIDES;
HOT CARRIER EFFECT;
INTERFACE TRAP;
MOSFET DEVICES;
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EID: 0029725136
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (5)
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References (5)
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