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Volumn 1, Issue , 1996, Pages 76-79
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Processes to achieve vibrating beams for an angular rate measurement sensor
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Author keywords
[No Author keywords available]
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Indexed keywords
ANISOTROPY;
CMOS INTEGRATED CIRCUITS;
DAMPING;
ETCHING;
FABRICATION;
MASKS;
NATURAL FREQUENCIES;
PROCESS CONTROL;
SEMICONDUCTING SILICON;
VIBRATIONS (MECHANICAL);
ANGULAR RATE MEASUREMENT SENSOR;
CORIOLIS ACCELERATION;
LOW INTRINSIC DAMPING;
VERTICAL SIDE WALLS;
VIBRATING BEAM STRUCTURES;
SILICON SENSORS;
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EID: 0029724497
PISSN: 08407789
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (2)
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References (6)
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