Vacuum arc deposition of TiN and TiOx films on large metallic and dielectric surfaces

International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV

Volumn 2, Issue , 1996, Pages 881-883

  Borisov, D P ^a   Koval, N N ^a   Kovsharov, N F ^a   Tolkachev, V S ^a   Schanin, P M ^a  

^a RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; ELECTRIC ARCS; ELECTRIC CURRENTS; METALLIC FILMS; OXIDES; PLASMA DEVICES; SURFACE TREATMENT; TITANIUM NITRIDE; VACUUM;

HOT CATHODE ARC CURRENT; PLASMA ASSISTED VACUUM DEPOSITION; PLASMA GENERATORS; TITANIUM OXIDE; VACUUM ARC DEPOSITION; VACUUM ARC EVAPORATORS; VACUUM CHAMBER;

DEPOSITION;

EID: 0029723640     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)