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Volumn , Issue , 1996, Pages 136-137
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High-frequency characteristics and its dependence on parasitic components in 0.1μm Si-MOSFETs
a a a a a
a
NEC CORPORATION
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
CURRENT VOLTAGE CHARACTERISTICS;
ELECTRIC NETWORK ANALYZERS;
ELECTRON BEAM LITHOGRAPHY;
EQUIVALENT CIRCUITS;
MICROWAVE CIRCUITS;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR JUNCTIONS;
TRANSCONDUCTANCE;
COPLANER PROBE HEAD;
CUTOFF FREQUENCY;
GATE RESISTANCE;
JUNCTION CAPACITANCE;
LOW RESISTIVITY GATE ELECTRODES;
MAXIMUM OSCILLATION FREQUENCY;
SHORT CHANNEL EFFECT;
TUNGSTEN POLYCIDE ELECTRODE;
MOSFET DEVICES;
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EID: 0029723467
PISSN: 07431562
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (10)
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References (4)
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