Atmospheric pressure chemical vapor deposition of titanium nitride from titanium bromide and ammonia

Materials Research Society Symposium - Proceedings

Volumn 410, Issue , 1996, Pages 283-288

  Gordon, Roy G ^a   Frisbie, Ross W ^a   Musher, Joshua ^a   Thornton, John ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; DISTILLATION; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; PRESSURE EFFECTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SOLVENT EXTRACTION; SOLVENTS; THERMAL EFFECTS;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; DIRECT LIQUID INJECTION SYSTEM; TITANIUM TETRABROMIDE;

TITANIUM NITRIDE;

EID: 0029720490     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)