Formation and structure of reaction layers in SiC/glass and SiC/SiC composites

Composites Part A: Applied Science and Manufacturing

Volumn 27, Issue 9 PART A, 1996, Pages 685-690

  Hahnel A ^a   Pippel, E ^a   Schneider, R ^a   Woltersdorf, J ^a   Suttor, D ^b  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Interlayer formation; Nicalon borosilicate glass; Nicalon SiC; Si C O system; Transmission electron microscopy; Volatility diagram

Indexed keywords

BOROSILICATE GLASS; CERAMIC MATRIX COMPOSITES; CHARACTERIZATION; CHEMICAL REACTIONS; COMPOSITION; ELECTRON MICROSCOPY; INTERFACES (MATERIALS); MODELS; OXIDATION; STRUCTURE (COMPOSITION); THERMODYNAMICS;

FORMATION MECHANISM; FOUR STAGE MODEL; INTERFACE REACTION; INTERLAYERS; SILICON CARBIDE GLASS COMPOSITE; VOLATILITY DIAGRAM;

COMPOSITE MATERIALS;

EID: 0029719424     PISSN: 1359835X     EISSN: None     Source Type: Journal    
DOI: 10.1016/1359-835X(96)00003-6     Document Type: Article

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