Reduction of the charging damage from electron shading

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1996, Pages 43-46

  Hashimoto, Koichi ^a   Hikosaka, Yukinobu ^a   Hasegawa, Akihiro ^a   Nakamura, Moritaka ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTRIC CURRENT MEASUREMENT; ELECTRIC CURRENTS; ELECTRONS; OXIDES; PLASMA ETCHING; PULSE MODULATION; SYNCHRONIZATION; TEMPERATURE;

DENSE LINE PATTERN ETCHING; ELECTRON SHADING; ELECTRON TEMPERATURE; FOWLER-NORDHEIM TUNNELING CURRENT; PLASMA DAMAGE; PLASMA PROCESSING; RADIOFREQUENCY BIAS; VIA ETCHING;

ELECTRIC FIELD EFFECTS;

EID: 0029719126     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)