Excess currents induced by hot-hole injection and F-N stress in thin SiO2 films

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 1996, Pages 113-116

  Teramoto, Akinobu ^a   Kobayashi, Kiyoteru ^a   Matsui, Yasuji ^a   Hirayama, Makoto ^a   Yasuoka, Akihiko ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC BREAKDOWN; ELECTRIC FIELD EFFECTS; ELECTRON TUNNELING; HOT CARRIERS; LEAKAGE CURRENTS; SILICA; STRESSES; THIN FILMS;

EXCESS CURRENTS; FOWLER-NORDHEIM STRESS; HOLE TRAPPING; HOT HOLE INJECTION;

SEMICONDUCTING FILMS;

EID: 0029718242     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)